Etching Equipment of the Nanofabrication Research Service Center

The Nanofabrication Research Service Center (NRSC) is a 2000 ft2 multi-user clean room facility located on the first floor of the Roy F. Mitte (RFM) building organized into five main areas where students and researchers can fabricate films, structures, and devices at the micrometer and nanometer scale. Users must enter through the gowning area that contains garments required to protect the cleanroom from particles. The class 10,000 instruction area houses high temperature furnaces, physical vapor deposition systems, wet chemical benches, chemical storage, and electrical test equipment utilized by undergraduate courses. The class 1000 research area houses deposition, etching, thermal treatment, and metrology equipment to support sponsored research and graduate coursework. The class 100 research space hosts the most sensitive lithography process equipment. The utility chase houses support equipment such as water cooling, vacuum pumps, exhaust abatement, and compressed gas delivery systems.

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  • Chimera Wet Hood

    Chimera is our 5ft HEMCO fume hood.  This all-purpose wet bench is used for acid, base, and solvent immersion processing (patterning/cleans).  This hood has an N2 gun for drying samples, sonicator, hot plates, and tub sink.

  • Hydra Wet Hood

    Hydra is our 8ft Kewaunee fume hood.  This wet bench is used to house dedicated wafer/sample processing in one of two spinners for standard wafer cleans (H2SO4, NH4OH, HCl, H2O2, HF) and III-V substrate pre-epi cleans (Br, HCl, Methanol)

  • Oxford ICP/RIE

    Our Oxford ICP-RIE Plaslab 180 utilizes a 3kW RF power supply to generate a remote plasma of Cl2, BCl3, H2, Ar, NF3, O2, SF6, and/or C4F8 gas species that can be further accelerated (300W table bias) toward a substrate resulting in a combination of physical and chemical dry etching for material removal.  The turbomolecular pumped system achieves a base pressure < 1E-7 Torr and is equipped with chuck temperature control from -110 to 350 degrees C.

  • Teaching Bay - Etch Station

    The Teaching Bay etch station is a polypropylene deck with two dunk tanks, two rinse tanks, one spin dryer, carboy drains, and fume extraction for corrosive chemical processing of 100mm diameter wafers or coupons.  The two etchant tanks are assigned to Buffered Oxide Etchant (contains Hydrofluoric Acid) and Aluminum etchant (acid mix, primary component is Phosphoric Acid).

  • Teaching Bay - SS Hood

    The Teaching Bay stainless steel hood is a 3-foot wet hood used primarily for flammable solvent processes (cleaning, lift off)-it also houses a sink for rinsing gloves and labware.

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