Lithography Equipment of the Nanofabrication Research Service Center

The Nanofabrication Research Service Center (NRSC) is a 2000 ft2 multi-user clean room facility located on the first floor of the Roy F. Mitte (RFM) building organized into five main areas where students and researchers can fabricate films, structures, and devices at the micrometer and nanometer scale. Users must enter through the gowning area that contains garments required to protect the cleanroom from particles. The class 10,000 instruction area houses high temperature furnaces, physical vapor deposition systems, wet chemical benches, chemical storage, and electrical test equipment utilized by undergraduate courses. The class 1000 research area houses deposition, etching, thermal treatment, and metrology equipment to support sponsored research and graduate coursework. The class 100 research space hosts the most sensitive lithography process equipment. The utility chase houses support equipment such as water cooling, vacuum pumps, exhaust abatement, and compressed gas delivery systems.

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  • PE-50 O2 Plasma Asher

    Our PE-50 Plasma Asher utilizes a 100W 13.56MHz power supply with auto-matching network in a direct contact parallel plate configuration for uniform plasma generation.  Samples up to 5" diameter can be exposed to two different ionized gas species (O2, arranged by request) for high rate etching of polymers, photo-resist, and other materials as well as for plasma cleaning and surface modification.

  • SuSS MJB4 Contact Aligner

    Our SuSS MJB4 Mask aligner utilizes a 350W Hg bulb with an i-line (365nm) filter to expose substrates up to 100mm diameter coated in the photoresist.  The sample stage and single field microscope head translate in x, y, and theta independently of a fixed mask stage (maximum 5”x5” mask plate) to allow for wafer-to-mask alignment and pattern transfer down to an ultimate resolution of 0.7 micrometers.  This equipment can also be configured to utilize an IR microscope mode to align features on the backside of the substrate to mask features intended to pattern the topside of the substrate.

  • Teaching Bay - Lithography Station

    The teaching bay lithography stations consist of a spincoater in a ductless fume hood to coat 100mm diameter wafers with photoresist and perform soft bake on a hotplate.  The custom aligners accommodate large scale feature masks on transparency slides with a videoscope and wafer stage with x-y-z-theta adjustments for wafer to mask alignment.

  • Xanthos Hood

    Xanthos is our 6ft wet hood used primarily for solvent and photo-resist processing-the lighting has been converted to prevent photo-resist exposure.  This hood houses a Laurell spin coater dedicated to photo-resist/polymer processing as well as a precision bake plate from Brewer Science.

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