Metrology Equipment of the Nanofabrication Research Service Center

The Nanofabrication Research Service Center (NRSC) is a 2000 ft2 multi-user clean room facility located on the first floor of the Roy F. Mitte (RFM) building organized into five main areas where students and researchers can fabricate films, structures, and devices at the micrometer and nanometer scale. Users must enter through the gowning area that contains garments required to protect the cleanroom from particles. The class 10,000 instruction area houses high temperature furnaces, physical vapor deposition systems, wet chemical benches, chemical storage, and electrical test equipment utilized by undergraduate courses. The class 1000 research area houses deposition, etching, thermal treatment, and metrology equipment to support sponsored research and graduate coursework. The class 100 research space hosts the most sensitive lithography process equipment. The utility chase houses support equipment such as water cooling, vacuum pumps, exhaust abatement, and compressed gas delivery systems.

Showing ## Results

Filter Panel

Filter by:
  • Deposition
  • Etch
  • Thermal
  • Photolithography
  • Metrology
  • Teaching Bay
  • Research Bay
  • Wet Bay
  • Litho Bay
  • 1
  • 2
  • 4
  • 0
  • 1
  • 2
  • 3
  • 4
  • 5
14 of 101 results
Click to use this tag to refine your search in the filters menu.
  • Axiotron Microscope

    The Zeiss Axiotron optical microscope is capable of magnifications from 5-100x. Digital image acquisition and post processing is available. This microscope is particularly useful for rapidly inspecting the photoresist pattern across an entire wafer owing to the fast translation stage.

     

     

  • Ellipsometer

    The Ellipsometer is used to analyze thin film structural and optical properties including thickness, segregation character of multicomponent films, and complex refractive indices.

  • F-20 Filmetrics

    The Filmetrics F-20 UV is used to measure the thickness and optical constants (n and k) of dielectric and semiconducting thin films.  The films must be optically smooth with a thickness range of 20-20000nm.

  • Optical Microscope

    The Olympus BX60M optical microscope is capable of magnifications from 5-100x. Digital image acquisition and post processing is available. This is commonly used for imaging thin film surfaces for particles/defects, photoresist patterns, masks, and etch residues during processing.

  • Surface Profilometer

    The DektakXT® stylus surface profiler is an advanced thin and thick film step height measurement tool.

Your filters produced no results
Try adjusting or clearing your filters to display more results