Scios 2 Dual Beam

Description

The Scios 2 Dual Beam Scanning Electron Microscope (SEM) is a state-of-the-art instrument for high resolution imaging, elemental analysis (using energy dispersive spectroscopy (EDS)), and sectioning/patterning with a focused ion beam (FIB). The system features a field emission gun to generate an electron beam with accelerating voltages ranging from 500V – 30 kV. The FIB is a gallium source (LMIS) with a broad range of available beam currents from 1.5 pA to 65 nA, allowing for fast milling times as well as precision polishing. The Scios 2 is capable of consistently generating TEM lamella using the electron beam, ion beam, GIS, and EasyLift nanomanipulator. Automated software programs such as AutoTEM and Auto Slice & View facilitate the preparation of TEM lamella and serial milling, respectively.

Capabilities

• NiCol FEG with Accelerating Voltages of 500V to 30kV
• Sidewinder HT Ion Column with Ga LMIS with beam currents 1.5 pA to 65 nA
• 5-axis precision stage
• High resolution Trinity in-lens detectors
• Ultra Dry Energy Dispersive Spectroscopy (EDS) detector
• EasyLift Nanomanipulator
• Gas Injection Systems (GIS): Platinum and Tungsten
• Retractable concentric backscatter detector
• Retractable STEM II detector
• Beam deceleration
• AutoTEM software for automated lamella preparation
• Auto Slice & View serial sectioning and imaging
• NPGS (Nabity Pattern Generation System) for Ebeam lithography